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据悉,ASML、佳能、尼康的DUV光刻机都采用了氟化氙(ArF)准分子激光技术,通过氩、氟气体混合物在高压电场下生成不稳定分子,释放出193nm波长的 ...
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能生产3nm!中科院成功研发全固态DUV光源技术:完全不同于ASML据悉,ASML、佳能、尼康的DUV光刻机都采用了氟化氙(ArF)准分子激光技术,通过氩、氟气体混合物在高压电场下生成不稳定分子,释放出193nm波长的 ...
ASML's high-end EUV lithography machines, the world's most advanced chip engraving system, are produced in the Netherlands can cost up to $350 million ... ASML's older DUV machines in fear of ...
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