Source: Wikipedia Basically, an advanced etch tool is a standalone system with a chamber. In operation, a wafer is inserted in the chamber. In one type of etch, plasma — which is an ionized gas — is ...

The Cobra ® ICP plasma source generates high-density reactive species at low pressure. Substrate DC bias is determined by a separate RF generator ... and outstanding uniformity with clean smooth ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today introduced Akara ®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool available. Akara ...