资讯
The Steven M. George research group concentrates on surface chemistry, thin-film growth & etching, and nanoscale engineering. We focus on atomic layer deposition (ALD), atomic layer etching (ALE), and ...
来自MSN2 个月
Overcoming stacking constraints in hexagonal boron nitride via metal-organic chemical vapor ...Researchers from Pohang University of Science and Technology (POSTECH ... This achievement, accomplished via metal-organic chemical vapor deposition (MOCVD) on a gallium nitride (GaN) substrate ...
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