Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Silicon photodiodes for detection of UV and EUV photon. The SXUV series diodes show less than 2% responsivity change after exposure to billions of 10 micrjoule/cm2 pulses from 157 and 193 nm excimer ...

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at Huawei's Dongguan facility, according to XFastest and Wccftech. Trial ...

Burn-Jeng Lin, the former VP of R&D at TSMC, is leading a team at a university in Taiwan focused on advancing subnanometer EUV research. Save my User ID and Password Some subscribers prefer to ...