Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...

Another focus has been on the use of attenuated phase shift masks (attPSM) to enhance resolution in EUV lithography. Research has shown that the imaging physics of attPSM in EUV differs ...

DNP has also completed the criteria evaluation for photomasks compatible with High-Numerical Aperture 2, the application being considered for next-generation semiconductors beyond the 2nm ...