What is Focused Ion Beam Milling? Focused ion beam (FIB) milling is a nanofabrication technique that uses a focused beam of ions to precisely mill, etch, or deposit materials at the nanoscale. It ...

Dry etching is split into three segments or modes — plasma etch, reactive ion etching (RIE), and sputter etch (a.k.a., ion beam etch). Each mode is used for different applications. Technically, ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

secondary ion mass spectrometer that is designed for analyzing secondary ions from the ion beam etch process. This system is equipped with integrated software consisting of process specific algorithms ...

Kaufman and Robinson, Inc. (KRI®) engineers and manufactures broad beam ion and plasma products. Our products are vacuum-based process tools which interact with materials at the atomic level. Typical ...