Luckily, [ProjectsInFlight] doesn’t treat his efforts to build semiconductors at home like a game — in fact, the first half of his video on etching oxide layers on silicon chips is devoted to ...

3. Plasma Etching: In this process, chemical etchant is introduced in the gas phase. For etching silicon oxide, CF4 (tetrafluoromethane) is used. In a chamber, there are two electrodes; one is holding ...

When silicon nitride and silicon oxide were tested separately, the etch rate increased for the nitride and the oxide layer ...

Researchers at the Tokyo City University have created a highly efficient and bendable tandem solar cell. The innovative ...

Researchers have now developed a new hardware platform for AI accelerators capable of handling significant workloads with ...