What is Focused Ion Beam Milling? Focused ion beam (FIB) milling is a nanofabrication technique that uses a focused beam of ions to precisely mill, etch, or deposit materials at the nanoscale. It ...

The latest abilities are offered for electron and ion beam-induced deposition and etching on DualBeam systems with optional Thermo Scientific MultiChem or GIS Gas Delivery Systems. Customized to ...

What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

Reactive Ion Etch (RIE) is a physical etch process. A rich plasma has been made just above the wafer, and the ions are expedited toward the surface to generate a highly powerful anisotropic etch.

secondary ion mass spectrometer that is designed for analyzing secondary ions from the ion beam etch process. This system is equipped with integrated software consisting of process specific algorithms ...

The nanowires are patterned into a fractal design using scanning-electron-beam lithography and transferred to the NbTiN layer through reactive-ion etching. The microcavity is finalized by ...

Kaufman and Robinson, Inc. (KRI®) engineers and manufactures broad beam ion and plasma products ... processes include the precision deposition of thin films, remote plasma etching of patterned wafers, ...