快科技2月25日消息，Intel宣布，ASML首批两台高数值孔径（High-NA EUV）极紫光刻机已经在其工厂投入生产。 初步数据显示，其效率、可靠性比上一代EUV ...

High NA EUV突破：英特尔季产3万片，imec 20nm良率90%，美光首用DRAM。 EUV技术自从其提出以来，面临着多重挑战，包括高成本、复杂的光学系统以及需要 ...

如今，人工智能芯片的需求正以指数级速度疯涨，可高昂的成本和复杂的工艺，让这项技术沦为少数公司的 “专属”。不过 ...

支撑人工智能革命的先进制程芯片需求呈现爆发式增长，正持续考验全球半导体产业的供给能力。从支撑大语言模型的超大规模数据中心，到智能手机、物联网设备和自动驾驶系统的边缘AI，各领域对尖端半导体的渴求已形成叠加效应。然而，这类芯片的制造 ...

Chinese electronics giant Huawei is testing elements for an extreme ultraviolet (EUV) lithography machine at its Dongguan facility, according to two sources posting photographs on X social media. The ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

在竞争对手增强生产能力的同时，美光对EUV采取了谨慎的态度。 美光公司上个月推出了第六代DRAM的原型，成为存储器半导体行业中第一个推出第六 ...

Silicon photodiodes for detection of UV and EUV photon. The SXUV series diodes show less than 2% responsivity change after exposure to billions of 10 micrjoule/cm2 pulses from 157 and 193 nm excimer ...

China is advancing in extreme ultraviolet (EUV) lithography, with a domestically developed system undergoing testing at Huawei's Dongguan facility, according to XFastest and Wccftech. Trial ...